Discover Pivotal Systems’ state-of-the-art flow monitoring and process control technology, meticulously designed for the global semiconductor manufacturing industry and high-tech industries.
As process geometries within the semiconductor industry continue to shrink to 3nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
The platform includes not only Pivotal’s Gas Flow Controller (GFC) product lines that offer high-accuracy, real-time monitoring and control of the most critical parameters difficult to control in wafer processing today: Gas Flow and Chamber Condition, but also advanced Flow Ratio Controller (FRC), Positional Mass Flow Controller(PFC), Pressure Controller, Ultra High-Speed Valve and etc.
At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency with our advanced flow process monitoring and control solutions.
Pivotal Systems paves the way for the future of flow control and monitoring.
The GFC-S combines Pivotal Systems’ patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.
The GFC X, the latest generation in Pivotal Systems’ high-flow product line, features a pressure-based flow controller with a position control valve, allowing for precise control. We offer one of the industry’s widest ranges of accuracy, making it ideal for various applications, including deposition processes.
Pivotal Systems is now introducing a flow ratio controller that uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer to wafer uniformity. It is the industry’s fastest flow ratio controller, with a settling time under one second.
Pivotal Systems’ product line includes Gas Flow Controllers (GFCs) and Flow Ratio Controllers (FRCs) that meet our customers’ flow needs across industries and applications where precise, accurate, and controlled flow is required. Our GFCs and FRCs offer best in class response time and measurement accuracy, while our proprietary machine learning software provides superior control that allows our GFCs to be maintenance and calibration free for the controller’s lifetime, reducing the total cost of ownership.
Pivotal Systems Corporation provides best-in-class monitoring and process control technology for the semiconductor manufacturing industry. Pivotal’s vision is to enable an order of magnitude increase in fab productivity and capital efficiency for current and future technology nodes. This vision is achieved through its real time in situ process monitoring and control solutions. Founded in 2004 and based in Fremont, California, the company is led by veterans from the semiconductor and high-tech industries.
Silicon Valley, California – November 4, 2024 – Pivotal Systems Corporation, a leading innovator in precision gas flow control technology,
(Ribbon-Cutting Ceremony for the Expansion and Relocation of Pivotal Systems Korea) Pivotal Systems Corporation (hereafter Pivotal Systems) held a ceremony
Strategic moves strengthen Pivotal’s global presence to meet rising demand for semiconductor solutions. Fremont, California – October 15, 2024 —
48389 Fremont Blvd.
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Fremont, CA, 94538
info@pivotalsys.com
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