Pivotal Systems Announces Appointment of Patrick Lowery as Executive VP
Fremont, CA — April 20, 2026 — Pivotal Systems Corporation has announced the appointment of semiconductor industry veteran Patrick Lowery as Executive Vice President.
Patrick brings more than 30 years of experience in global semiconductor manufacturing and advanced technologies with a strong focus on gas delivery systems including mass flow controllers. Prior to joining Pivotal Systems, he served as the Vice President of Advanced Technology at HORIBA. Before that, Patrick was the Director of Technology and Chief Engineer at CIRCOR International, a leading manufacturer of mission-critical flow control products. He began his career as an engineer at Unit Instruments, an early notable MFC leader that was eventually integrated by Brooks Instrument. Patrick holds a bachelor’s degree in Materials Science and Engineering from New Mexico Institute of Mining and Technology and an MBA from Wake Forest University.
In his new role, Patrick will help to drive commercial and engineering activities across Pivotal, ensuring alignment with growth initiatives and customer strategy. Patrick’s industry expertise, established business relationships, and proven leadership will be critical in helping Pivotal to grow and diversify for its next expansion stage.
About Pivotal Systems
Pivotal Systems Corporation provides best-in-class gas flow control platforms for the global semiconductor industry. Its innovative products enable precise, repeatable, and real-time gas flow control essential for advanced semiconductor manufacturing. Headquartered in Fremont, California, with a growing global footprint, Pivotal Systems serves leading semiconductor equipment manufacturers and integrated device manufacturers (IDMs) around the world. Pivotal is committed to innovation, operational excellence, and enabling the future of semiconductor manufacturing.
For more information about Pivotal Systems and its full range of gas flow control devices, visit www.pivotalsys.com.
The Future of Flow Control is Now.