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MONITORING & CONTROL TECHNOLOGY PLATFORM

Pivotal Systems provides best-in-class monitoring and control technology platform for the global semiconductor industry.

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Gas Flow Control products

As process geometries within the semiconductor industry continue to shrink to 10 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers. Pivotal Systems’ GFC paves the way for the future of gas flow control. The GFC combines Pivotal’s patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.

Product Series

GAS FLOW CONTROLLERS (GFCs)

FLOW RATIO CONTROLLER (FRC)

FRC

Pivotal is now introducing a flow ratio controller that uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer to wafer uniformity. It’s the industry’s fastest Flow Ratio Controller, meeting a <1 sec. settling time requirement. Available in 3 and 4 channel configurations and both ECAT and DNET communication.

GFC-S

GFC5™ GFC20™ GFC200™ GFC1000™ GFC2000™

Pivotal Systems’ GFC-S paves the way for the future of gas flow control. The GFC-S combines Pivotal’s patented, high accuracy GFM system with our patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes. At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency by utilizing our innovative solutions.

GFC X

GFC-X

Based on Pivotal Systems' proprietary position control valve and field proven robust design, we are introducing the GFC-X as a high-performance and economical gas flow controller.

GFC-T

A lower cost thermal solution, servicing broader applications and markets. Pivotal Systems’ GFC-T offers a thermal MFC solution for a wide flow range from 2 SCCM to 500 SLM At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency by utilizing our innovative solutions.

GFC-S LOW FLOW GAS FLOW CONTROLLER (GFC5)

GFC5™

The GFC5 is Pivotal Systems low flow solution that can flow gases accurately from 0.025 sccm to 5 sccm

HIGH FLOW GAS FLOW CONTROLLER (GFC HFlo)

GFC5L™ GFC20L™ GFC50L™

The high flow GFC combines a differential pressure with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.

FLOW RATIO CONTROLLER (FRC)

The Flow Ratio Controller is Pivotal Systems’ newest product series. Using Pivotal Systems’ proprietary positional valve, the FRC maintains the high accuracy and speed that Pivotal flow control products are known for.