Gas Flow Control Systems

Pivotal Systems provides best-in-class gas flow monitoring and control technology platform for the global semiconductor industry.

FRC
Pivotal is now introducing a flow ratio controller that uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer to wafer uniformity. It’s the industry’s fastest Flow Ratio Controller, meeting a <1 sec. settling time requirement. Available in 3 and 4 channel configurations and both ECAT and DNET communication.
GFC5™ GFC20™ GFC200™ GFC1000™ GFC2000™
Pivotal Systems’ GFC-S paves the way for the future of gas flow control. The GFC-S combines Pivotal’s patented, high accuracy GFM system with our patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes. At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency by utilizing our innovative solutions.
GFC-X
Based on Pivotal Systems' proprietary position control valve and field proven robust design, we are introducing the GFC-X as a high-performance and economical gas flow controller.
GFC-T
A lower cost thermal solution, servicing broader applications and markets. Pivotal Systems’ GFC-T offers a thermal MFC solution for a wide flow range from 2 SCCM to 500 SLM At Pivotal Systems, we aim to significantly enhance fab productivity and capital efficiency by utilizing our innovative solutions.
GFC5™
The GFC5 is Pivotal Systems low flow solution that can flow gases accurately from 0.025 sccm to 5 sccm

About Pivotal Systems

Pivotal Systems provides the best-in-class gas flow monitoring and control technology platform for the global semiconductor industry. The company’s proprietary hardware and software utilizes advanced machine learning to enable preventative diagnostic capability resulting in an order of magnitude increase in fab productivity and capital efficiency for existing and future technology nodes.

The platform includes Pivotal’s Gas Flow Controller (GFC) product lines that offer high-accuracy, real-time monitoring and control of the most critical parameters difficult to control in wafer processing today: Gas Flow and Chamber Condition.

 Pivotal’s Ultra-High Speed GFCs operate at speeds down to ≤ 10msec on/off for process set point response time. This represents a significant speed improvement over other suppliers in the industry. At the same time, Pivotal can guarantee flow accuracy of ±0.5% of set point for the actual gas at these speeds. This leads to improved chamber matching and potential process improvements.

Pivotal’s new High Flow GFCs flows up to 50 slm. Leading manufacturers are already qualifying the High Flow GFCs into their fabs for the most advanced CVD and ALD processes.

IDMs, foundries and OEMs use Pivotal’s products to dramatically improve yield and productivity by avoiding catastrophic scrap events, tightening process windows and matching chambers more effectively.

To meet strong industry demand, Pivotal Systems now operates high-capacity manufacturing facilities in the United States and Korea with extending the product lines, and the company keeps increasing its total unit production since 2014.

Latest News

Jan-Yu Weng CEO Announcement

Dear Pivotal Systems Partners, It is with great pleasure and excitement that we announce the appointment of our new Chief

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