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Technology and Capabilities What is PROCESS MATCHING? Matching process results wafer to wafer and chamber to chamber has never been more difficult and costly in today's semiconductor manufacturing market. The primary reason - smaller technology nodes, with tightly balanced process recipe requirements are hitting up against the tool's normal window of process variation. These chamber "micro-variations" end up wreaking havoc on yield (bin and scrap) and can take a long time to troubleshoot with traditional manually-intensive chamber matching approaches. Process Matching solutions identify and remove micro-variations that exist during wafer processing through an in-depth in situ understanding of the wafer processing environment. It is only through a granular understanding of the chamber environment during wafer processing for each and every wafer that chamber micro-variations can be properly identified, analyzed and systematically removed. Pivotal's Answer to Process Matching - Process Match™ Technology Pivotal takes the art out of chamber and process matching through its suite of patented in situ sensors and algorithms, its deep process know-how and expertise, and its robust turnkey control and fault detection applications.
1. Process Match™ Suite of In Situ Sensors
2. Process Know How & Experience
3. Process Match™ Turnkey Automated Control Solutions
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