Products > Product Overview > Gas Flow Controller
Gas Flow Controller (GFC)
As process geometries within the semiconductor industry continue to shrink to 22 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
Pivotal’s GFC paves the way for the future of gas flow control by delivering an order of magnitude improvement in key performance specifications.
Now Shipping:
Releasing soon:
Now Shipping:
- GFC-200 – Datasheet (brief, 0.3Mb)
- GFC-200 – Datasheet (long, 9Mb)
- GFC Whitepaper – Application Note
- GFM Accuracy – Application Note
Releasing soon:
- GFC-2000 (2 slpm full scale)
- GFC-5000 (5 slpm full scale)
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Innovative Design
Robust Design, No Orifice
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Widest Flow Range with Accuracy
0.05 - 100% Full Scale
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Best Flow Accuracy
0.5% of Set Point for 0.5 - 100% Full Scale
0.005% of Full Scale for 0.005 - 0.5% Full Scale -
Best Turndown Ratio
2000:1
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Fastest Settling Time for Turn-on and Turndown
< 50 ms
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Effect of Pressure and Temperature
Invariant
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Automated In Situ Calibration
NIST Traceable
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Competitive Comparison
Best-in-Class