Control and Fault Detection Applications
Product	Application	Etch	CVD
Omega3.0TM	End point system for dielectric etch processes with very low exposed areas (<1%) also used as a fault detection system to prevent etch-stop or other wafer misprocessing events View our joint Qimonda presentation: "A new method for very low open area endpoint detection" - AEC/APC Conference April 18th, 2007. (PDF 2Mb)
GasFlowMonitorTM	Precise in situ monitor of gas delivery systems to ensure MFC flow rates are within 0.5% of desired actual flow. Useful for detection of gas flow variations before "etch stop" conditions occur or film quality issues occur
AsherFDTM	Active endpoint and fault detection system for remote and non-remote plasma source PR strip / ash as well as Oxide etch dry cleans
LeakDetectTM	In situ detection of very low level atmospheric leaks (<1% contamination) due to O-ring seal failures for CVD and etch chambers
CleanEPTM	Active endpoint for HDP-CVD in situ dry cleans
ToolTraceTM Diagnostics	A diagnostic hardware / software package for data visualization and chamber matching efforts

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