News
Gas Flow Controller (GFC) Introduced at Semicon West 2011
July 12, 2011
GFC Enables an Order of Magnitude Performance Improvement in Gas Flow Control for Advanced Wafer Processing
July 12, 2011
GFC Enables an Order of Magnitude Performance Improvement in Gas Flow Control for Advanced Wafer Processing
Pivotal Publishes Joint Technical Papers with IBM and Samsung
July 1, 2011
Papers Highlight the Technical Innovations of Gas Flow Controller (GFC) and the Benefits of Gas Flow Monitor (GFM)
July 1, 2011
Papers Highlight the Technical Innovations of Gas Flow Controller (GFC) and the Benefits of Gas Flow Monitor (GFM)
Pivotal’s Gas Flow Monitoring (GFM) Wins the 2011 R&D 100 Award
June 22, 2011
Experts, Editors Pick GFM as one of the Top High Technology Innovations of the Year
June 22, 2011
Experts, Editors Pick GFM as one of the Top High Technology Innovations of the Year
Pivotal Systems Awarded First Key Patent for Gas Flow Monitoring
December 10, 2010
Patent Establishes Pivotal at the Forefront of Gas Flow control For the Semiconductor Industry
December 10, 2010
Patent Establishes Pivotal at the Forefront of Gas Flow control For the Semiconductor Industry
Real-time In Situ Gas Flow Monitoring Specified for New Etch Tool Purchases by Leading IDMs
June 30, 2010
Leading IDMs Have Concluded that Real Time In Situ Gas Flow Monitoring is Critical for New Etch Tools
June 30, 2010
Leading IDMs Have Concluded that Real Time In Situ Gas Flow Monitoring is Critical for New Etch Tools
Pivotal Introduces GFM-800A – In Situ Gas Flow Monitoring With Absolute Accuracy of ±0.5%
May 25, 2010
GFM-800A Provides Necessary Accuracy For Advanced Node Wafer Processing Applications
May 25, 2010
GFM-800A Provides Necessary Accuracy For Advanced Node Wafer Processing Applications
Pivotal Systems Expands Executive Leadership Team with Global Sales Veterans
March 8, 2010
Cliff Neal Joins as Vice President of Global Sales – Augments Sales Team With Industry Veterans
March 8, 2010
Cliff Neal Joins as Vice President of Global Sales – Augments Sales Team With Industry Veterans
Pivotal Introduces GFM-800 – Real Time In Situ Gas Flow Monitoring
Jan 18, 2011
GFM Delivers a Critical Real Time View into Gas Flow Delivery Systems for Chamber Matching
Jan 18, 2011
GFM Delivers a Critical Real Time View into Gas Flow Delivery Systems for Chamber Matching
Pivotal’s Sensor X Achieves Design Win with a Leading OEM for Contamination, Conditioning and Dry Clean Optimization on CVD and Etch Tools
Sept 10, 2009
Atomic Level Excitation Allows for a Multitude of Applications and a Compelling ROI
Sept 10, 2009
Atomic Level Excitation Allows for a Multitude of Applications and a Compelling ROI
Pivotal’s Sensor X Improves Leading OEM’s ALD Equipment Cost of Ownership
May 12, 2009
Sensor X Ability to Excite Titanium in Dry Clean Processes Allows for Dramatic Improvement in Tool
Productivity
May 12, 2009
Sensor X Ability to Excite Titanium in Dry Clean Processes Allows for Dramatic Improvement in Tool
Productivity
Pivotal Moves Headquarters to Larger Office to Accommodate for Higher Growth
July 8, 2008
Company Poised to Ramp With the Semiconductor Industry
July 8, 2008
Company Poised to Ramp With the Semiconductor Industry
Industry Veteran Omesh Sharma joins Pivotal Systems as CFO
June 27, 2008
Appointment is an Important Milestone for the Growth and Maturity of Pivotal
June 27, 2008
Appointment is an Important Milestone for the Growth and Maturity of Pivotal
Industry Veteran John Hoffman joins Pivotal Systems as CEO
June 6, 2008
Appointment Comes as Pivotal Experiences High Growth
June 6, 2008
Appointment Comes as Pivotal Experiences High Growth
Pivotal’s Sensor X Achieves a Design Win with a Leading OEM for Low Exposed Area Etch End Point Detection
July 9, 2007
Atomic Level Vision Allows for Robust End Pointing of Low Exposed Area Oxide Etch Processes
July 9, 2007
Atomic Level Vision Allows for Robust End Pointing of Low Exposed Area Oxide Etch Processes
Pivotal Introduces Sensor X – An Unprecedented Atomic Level Gas Composition Analysis Tool
March 23, 2007
Sensor X Offers a Multitude of Applications for Real Time Monitoring of the Wafer Processing Environment
March 23, 2007
Sensor X Offers a Multitude of Applications for Real Time Monitoring of the Wafer Processing Environment
Pivotal Introduces Industry’s First In Situ Leak Detection System for CVD Systems
March 10, 2006
Pivotal’s LeakDetect Identifies Atmospheric Micro-Leaks During Wafer Processing
March 10, 2006
Pivotal’s LeakDetect Identifies Atmospheric Micro-Leaks During Wafer Processing
Pivotal Raises $10 million in Funding to Meet Growing Demand for its Real Time Monitoring and
Control Solutions
December 23, 2005
Financing aimed at expanding product portfolio and accelerating IDM and OEM penetration
Control Solutions
December 23, 2005
Financing aimed at expanding product portfolio and accelerating IDM and OEM penetration
Pivotal Introduces Industry’s First Advanced Etch End Point System with Adoption by Leading IDMs
July 15, 2005
Pivotal’s Omega 3.0 Provides Reliable End Pointing of Low Exposed Area Oxide Etches
July 15, 2005
Pivotal’s Omega 3.0 Provides Reliable End Pointing of Low Exposed Area Oxide Etches
Pivotal Raises $7 million in funding
April 30, 2004
Pivotal Systems capitalizing on fundamental shifts in the semiconductor manufacturing market by providing
real time process monitoring and control
April 30, 2004
Pivotal Systems capitalizing on fundamental shifts in the semiconductor manufacturing market by providing
real time process monitoring and control