Gas Flow Controller (GFC)
As process geometries within the semiconductor industry continue to shrink to 14 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
Pivotal’s GFC paves the way for the future of gas flow control by delivering an order of magnitude improvement in key performance specifications.

Now Shipping:
  • GFC-20 (20 sccm full scale)
  • GFC-200
  • GFC-1000
  • GFC-2000

Releasing soon:
  • GFC-5000 (5 slpm full scale)